DocumentCode :
3062459
Title :
Current status of 300 mm/0.25-0.18 μm technologies
Author :
Ohba, Takayuki
Author_Institution :
Semicond.. Leading Edge Technol. Inc., Yokohama, Japan
fYear :
1998
fDate :
1998
Firstpage :
21
Lastpage :
24
Abstract :
Since November 1996, Selete has evaluated more than 20 pieces of equipment for 300 mm wafer processes from FEOL to BEOL. According to Selete´s evaluation plan, the middle of 2000 is predicted as the start-up for the first volume production using 300 mm wafers. In order to ensure productivity of equipment and processes, Selete has made specifications to meet the requirements for fabrication of device structures down to 0.18 μm technology. These specifications have been validated by electrical evaluation and marathon testing. Selete´s program for 300 mm equipment and materials will continue until March 2000 and will evaluate about 70 pieces of equipment. More than two pieces of equipment will be evaluated for each unit process
Keywords :
integrated circuit manufacture; integrated circuit technology; production; 0.18 to 0.25 micron; 300 mm; 300 mm wafer processes; BEOL; FEOL; IC manufacture; Selete evaluation plan; deep submicron technologies; electrical evaluation; productivity; volume production; Conducting materials; Costs; Economic forecasting; Fabrication; Lead compounds; Manufacturing; Production; Productivity; Semiconductor device manufacture; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
Type :
conf
DOI :
10.1109/ICSICT.1998.785775
Filename :
785775
Link To Document :
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