• DocumentCode
    3063171
  • Title

    Research of a Fast High Voltage Semiconductor Switch

  • Author

    Chu, Yen-Kuei ; Lin, Hsiu-Sheng ; Lai, Po-Chou

  • Author_Institution
    Grad. Inst. of Comput. & Commun. Eng., Nat. Taipei Univ. of Technol., Taipei, Taiwan
  • fYear
    2010
  • fDate
    6-9 Sept. 2010
  • Firstpage
    52
  • Lastpage
    56
  • Abstract
    Presently, there are many categories of devices operating at Pulse Forming Networks (PFNs) for high Pulse Repetition Frequency (PRF) modulation. This paper aims to discuss a fast high voltage semiconductor switch using Metal Oxide Semiconductors Field Effect Transistors (MOSFETs) suitable for use in PRF circuits, and switching is fast compared with the others (e.g. using IGBTs, Insulated Gate Bipolar Transistors etc.). In addition, this device possesses three major benefits with regard to PRF. Firstly, its improved transitional performance effectively, and with excellent operating parameters (e.g. fast output transition time, pulse width). Secondly, it is able to operate in considerably high voltage (e.g. over three kilovolts, 3kV). Lastly, it possess an applicable range widely, such as communication engineering (e.g. PRF radar systems), physical sciences (e.g. Mass Spectrometer and Nuclear Magnetic Resonance) and electrical engineering (e.g. Laser systems) etc.
  • Keywords
    field effect transistor switches; power field effect transistors; power semiconductor switches; MOSFET; high voltage semiconductor switch; metal oxide semiconductors field effect transistors; operating parameters; output transition time; pulse forming networks; pulse repetition frequency modulation; pulse width; transitional performance; Capacitors; Insulated gate bipolar transistors; MOSFETs; Resistors; Switches; Switching circuits; Voltage measurement; Insulated Gate Bipolar Transistors (IGBTs); Metal Oxide Semiconductors Field Effect Transistors (MOSFETs); Pulse Forming Networks (PFNs); Pulse Repetition Frequency (PRF);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Parallel and Distributed Processing with Applications (ISPA), 2010 International Symposium on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-8095-1
  • Electronic_ISBN
    978-0-7695-4190-7
  • Type

    conf

  • DOI
    10.1109/ISPA.2010.58
  • Filename
    5634409