DocumentCode
3063171
Title
Research of a Fast High Voltage Semiconductor Switch
Author
Chu, Yen-Kuei ; Lin, Hsiu-Sheng ; Lai, Po-Chou
Author_Institution
Grad. Inst. of Comput. & Commun. Eng., Nat. Taipei Univ. of Technol., Taipei, Taiwan
fYear
2010
fDate
6-9 Sept. 2010
Firstpage
52
Lastpage
56
Abstract
Presently, there are many categories of devices operating at Pulse Forming Networks (PFNs) for high Pulse Repetition Frequency (PRF) modulation. This paper aims to discuss a fast high voltage semiconductor switch using Metal Oxide Semiconductors Field Effect Transistors (MOSFETs) suitable for use in PRF circuits, and switching is fast compared with the others (e.g. using IGBTs, Insulated Gate Bipolar Transistors etc.). In addition, this device possesses three major benefits with regard to PRF. Firstly, its improved transitional performance effectively, and with excellent operating parameters (e.g. fast output transition time, pulse width). Secondly, it is able to operate in considerably high voltage (e.g. over three kilovolts, 3kV). Lastly, it possess an applicable range widely, such as communication engineering (e.g. PRF radar systems), physical sciences (e.g. Mass Spectrometer and Nuclear Magnetic Resonance) and electrical engineering (e.g. Laser systems) etc.
Keywords
field effect transistor switches; power field effect transistors; power semiconductor switches; MOSFET; high voltage semiconductor switch; metal oxide semiconductors field effect transistors; operating parameters; output transition time; pulse forming networks; pulse repetition frequency modulation; pulse width; transitional performance; Capacitors; Insulated gate bipolar transistors; MOSFETs; Resistors; Switches; Switching circuits; Voltage measurement; Insulated Gate Bipolar Transistors (IGBTs); Metal Oxide Semiconductors Field Effect Transistors (MOSFETs); Pulse Forming Networks (PFNs); Pulse Repetition Frequency (PRF);
fLanguage
English
Publisher
ieee
Conference_Titel
Parallel and Distributed Processing with Applications (ISPA), 2010 International Symposium on
Conference_Location
Taipei
Print_ISBN
978-1-4244-8095-1
Electronic_ISBN
978-0-7695-4190-7
Type
conf
DOI
10.1109/ISPA.2010.58
Filename
5634409
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