DocumentCode :
3063171
Title :
Research of a Fast High Voltage Semiconductor Switch
Author :
Chu, Yen-Kuei ; Lin, Hsiu-Sheng ; Lai, Po-Chou
Author_Institution :
Grad. Inst. of Comput. & Commun. Eng., Nat. Taipei Univ. of Technol., Taipei, Taiwan
fYear :
2010
fDate :
6-9 Sept. 2010
Firstpage :
52
Lastpage :
56
Abstract :
Presently, there are many categories of devices operating at Pulse Forming Networks (PFNs) for high Pulse Repetition Frequency (PRF) modulation. This paper aims to discuss a fast high voltage semiconductor switch using Metal Oxide Semiconductors Field Effect Transistors (MOSFETs) suitable for use in PRF circuits, and switching is fast compared with the others (e.g. using IGBTs, Insulated Gate Bipolar Transistors etc.). In addition, this device possesses three major benefits with regard to PRF. Firstly, its improved transitional performance effectively, and with excellent operating parameters (e.g. fast output transition time, pulse width). Secondly, it is able to operate in considerably high voltage (e.g. over three kilovolts, 3kV). Lastly, it possess an applicable range widely, such as communication engineering (e.g. PRF radar systems), physical sciences (e.g. Mass Spectrometer and Nuclear Magnetic Resonance) and electrical engineering (e.g. Laser systems) etc.
Keywords :
field effect transistor switches; power field effect transistors; power semiconductor switches; MOSFET; high voltage semiconductor switch; metal oxide semiconductors field effect transistors; operating parameters; output transition time; pulse forming networks; pulse repetition frequency modulation; pulse width; transitional performance; Capacitors; Insulated gate bipolar transistors; MOSFETs; Resistors; Switches; Switching circuits; Voltage measurement; Insulated Gate Bipolar Transistors (IGBTs); Metal Oxide Semiconductors Field Effect Transistors (MOSFETs); Pulse Forming Networks (PFNs); Pulse Repetition Frequency (PRF);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Parallel and Distributed Processing with Applications (ISPA), 2010 International Symposium on
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-8095-1
Electronic_ISBN :
978-0-7695-4190-7
Type :
conf
DOI :
10.1109/ISPA.2010.58
Filename :
5634409
Link To Document :
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