DocumentCode
3063414
Title
High-power millimeter waves applications in plasmas and industrial technologies
Author
Litvak, A.G.
Author_Institution
Inst. of Appl. Phys., Acad. of Sci., Nizhny Novgorod, Russia
fYear
2004
fDate
27 Sept.-1 Oct. 2004
Firstpage
827
Lastpage
828
Abstract
Creation of gyrotrons reveals new possibilities for development of efficient tools for scientific experiments and promising technologies for industrial material processing. The presentation reviews physical basics of gyrotron applications including plasma heating and current drive in magnetic fusion setups, creation of sources of dense plasma and beams of multi-charge ions, deposition of polycrystalline diamond films by the CVD method, nanoceramic sintering, and annealing of semiconductor structures.
Keywords
annealing; chemical vapour deposition; diamond; elemental semiconductors; gyrotrons; high-frequency discharges; plasma Bernstein waves; plasma confinement; plasma radiofrequency heating; plasma sources; silicon; sintering; submillimetre wave tubes; thin films; C; CVD method; Si; gyrotrons; high power millimeter waves; industrial material processing; magnetic fusion; multicharge ions; nanoceramic sintering; plasma applications; plasma heating; plasma sources; polycrystalline diamond films; semiconductor structure; Gyrotrons; Heating; Magnetic semiconductors; Materials processing; Millimeter wave technology; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Infrared and Millimeter Waves, 2004 and 12th International Conference on Terahertz Electronics, 2004. Conference Digest of the 2004 Joint 29th International Conference on
Print_ISBN
0-7803-8490-3
Type
conf
DOI
10.1109/ICIMW.2004.1422350
Filename
1422350
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