Title :
Focused ion beam analysis technology
Author :
Wang, Jia Ji ; Chang, Xu ; Zong, Xiang Fu
Author_Institution :
Nat. Microanal. Center, Fudan Univ., Shanghai, China
Abstract :
In the last decade, focused ion beam (FIB) technology has been attracting attention as a tool with submicron fabrication capabilities because of increasing circuit density and decreasing feature dimension in VLSI devices. This paper introduces basic FIB functions and a number of its technological applications in the field of microelectronics such as microscopic cross-sectioning, transmission electron microscopy (TEM) sample preparation, microcircuit repair and Al microstructure observation. Several examples are presented for these applications
Keywords :
VLSI; focused ion beam technology; integrated circuit technology; micromachining; transmission electron microscopy; Al microstructure observation; TEM; VLSI; focused ion beam analysis technology; microcircuit repair; microscopic cross-sectioning; submicron fabrication; Circuits; Conducting materials; Electron beams; Gases; Ion beams; Paper technology; Scanning electron microscopy; Sputter etching; Sputtering; Transmission electron microscopy;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
DOI :
10.1109/ICSICT.1998.785883
