Title :
Plasma Charging Damage: An Overview
Author_Institution :
Stanford University
Keywords :
Degradation; Design for quality; Electrons; Plasma devices; Plasma materials processing; Plasma properties; Plasma temperature; Surface charging; Tunneling; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715191
