DocumentCode :
3066797
Title :
Non-destructive Prognosis Method Of Oxide Degradation- A Rapid Monitoring Of Oxide Energy Band Changes Cause By Semiconductor Processing
Author :
Aum, Paul K. ; Dao, Thuy
Author_Institution :
Spider Systems Inc.
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
15
Lastpage :
19
Keywords :
Breakdown voltage; Degradation; Electric breakdown; Insulation; Monitoring; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715193
Filename :
715193
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3066797
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