DocumentCode :
3067057
Title :
Prediction of Plasma Charging Induced Gate Oxide Tunneling Current and Antenna Dependence by Plasma Charging Probe
Author :
Ma, Shawming ; McVittie, James P.
Author_Institution :
Stanford University
fYear :
1996
fDate :
14-14 May 1996
Firstpage :
20
Lastpage :
23
Keywords :
Antenna measurements; Current measurement; Distortion measurement; Plasma applications; Plasma measurements; Plasma sources; Probes; Resists; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715194
Filename :
715194
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3067057
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