DocumentCode :
3067727
Title :
Surface Photovoltage and Contact Potential Difference Imaging of Defects Introduced by Plasma Processing of IC Devices
Author :
Nauka, K. ; Theil, J. ; Chi, C. ; Greene, W.M. ; Shohet, J.L.
Author_Institution :
Hewlett-Packard Company
fYear :
1996
fDate :
14-14 May 1996
Firstpage :
34
Lastpage :
36
Keywords :
Antenna measurements; Degradation; Dielectrics; Monitoring; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma properties; Plasma sheaths;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715197
Filename :
715197
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3067727
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