• DocumentCode
    3067810
  • Title

    A novel analytical physical model for thin film SOI RESURF structure based on 2-D Poisson equation

  • Author

    Li, Wenhong ; Luo, Jinsheng

  • Author_Institution
    Microelectron. Inst., Xi´´an Jiaotong Univ., China
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    724
  • Lastpage
    727
  • Abstract
    In this paper, a novel analytical physical model for a thin film SOI RESURF structure is developed, based on the 2D Poisson equation, and the influence of the field SiO2 interface charge is considered. The thin film SOI RESURF structure is analyzed using this novel model. There are two electric field peak values at the interfaces of the p+n and n+n junctions. The potential distribution is similar to a step between the p+n and n+ n junctions. The field SiO2 interface charge makes the electric field increase at the interface of the p+n junction, and reduces the electric field at the interface of the n+n junction. The analytical results agree with the simulations of MEDICI
  • Keywords
    Poisson equation; integrated circuit modelling; semiconductor device models; silicon-on-insulator; 2D Poisson equation; analytical physical model; interface charge; n+n junctions; p+n junctions; thin film SOI RESURF structure; Analytical models; CMOS technology; Isolation technology; Medical simulation; Permittivity; Poisson equations; Power integrated circuits; Silicon on insulator technology; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    0-7803-4306-9
  • Type

    conf

  • DOI
    10.1109/ICSICT.1998.786077
  • Filename
    786077