DocumentCode
3067810
Title
A novel analytical physical model for thin film SOI RESURF structure based on 2-D Poisson equation
Author
Li, Wenhong ; Luo, Jinsheng
Author_Institution
Microelectron. Inst., Xi´´an Jiaotong Univ., China
fYear
1998
fDate
1998
Firstpage
724
Lastpage
727
Abstract
In this paper, a novel analytical physical model for a thin film SOI RESURF structure is developed, based on the 2D Poisson equation, and the influence of the field SiO2 interface charge is considered. The thin film SOI RESURF structure is analyzed using this novel model. There are two electric field peak values at the interfaces of the p+n and n+n junctions. The potential distribution is similar to a step between the p+n and n+ n junctions. The field SiO2 interface charge makes the electric field increase at the interface of the p+n junction, and reduces the electric field at the interface of the n+n junction. The analytical results agree with the simulations of MEDICI
Keywords
Poisson equation; integrated circuit modelling; semiconductor device models; silicon-on-insulator; 2D Poisson equation; analytical physical model; interface charge; n+n junctions; p+n junctions; thin film SOI RESURF structure; Analytical models; CMOS technology; Isolation technology; Medical simulation; Permittivity; Poisson equations; Power integrated circuits; Silicon on insulator technology; Transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-4306-9
Type
conf
DOI
10.1109/ICSICT.1998.786077
Filename
786077
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