DocumentCode :
3068092
Title :
Channel design of silicon-on-insulator (SOI) MOSFET for low-voltage low-power application
Author :
Yang, Bing ; Huang, Ru ; Zhang, Xing ; Wang, Yang Yuan
Author_Institution :
Inst. of Microelectron., Beijing Univ., China
fYear :
1998
fDate :
1998
Firstpage :
734
Lastpage :
737
Abstract :
For silicon-on-insulator (SOI) technology compared with the bulk circuit, an obvious improvement in power consumption and speed is always observed for the corresponding SOI circuit. Due to their electrical properties, SOI devices may be a solution for low-power application. But FD devices and PD devices have different properties. Detailed analysis and comparison between the different SOI devices operating at low voltage is needed. In this paper, Medici 4.0 is used to study FD and FD devices. Different device parameter influence on devices and circuits behaviour is described
Keywords :
MOSFET; semiconductor device models; silicon-on-insulator; FD devices; Medici 4.0; PD devices; SOI MOSFET; Si-SiO2; channel design; device parameter; low voltage; low-voltage low-power application; power consumption; silicon-on-insulator; speed; CMOS technology; Capacitance; Doping; Energy consumption; Leakage current; Low voltage; MOSFET circuits; Microelectronics; Silicon on insulator technology; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
Type :
conf
DOI :
10.1109/ICSICT.1998.786092
Filename :
786092
Link To Document :
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