Title :
A New Etching Method for Reducing the Electron Shading Damage Using ICP Etcher
Author_Institution :
Yamaha Corporation
Keywords :
Coils; Dielectrics; Electrodes; Electrons; Etching; MOSFETs; Metallization; Plasma applications; Plasma density; Resists;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715201
