DocumentCode

3068558

Title

A New Etching Method for Reducing the Electron Shading Damage Using ICP Etcher

Author

Tabara, Suguru

Author_Institution

Yamaha Corporation

fYear

1996

fDate

14-14 May 1996

Firstpage

51

Lastpage

53

Keywords

Coils; Dielectrics; Electrodes; Electrons; Etching; MOSFETs; Metallization; Plasma applications; Plasma density; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1996 1st International Symposium on

Conference_Location

Santa Clara, CA, USA

Print_ISBN

0-9651577-0-9

Type

conf

DOI

10.1109/PPID.1996.715201

Filename

715201