DocumentCode
3069434
Title
Observation and explanation of electron emission from amorphous diamond films
Author
Jingfang, Xu ; Qiong, Li ; Zhong, Fan ; Jiangyun, Zhou ; Dongsheng, Mao ; Kang, W.P. ; Davidson, J.L.
Author_Institution
Dept. of Electron. Sci. & Technol., ECNU, Shanghai, China
fYear
1998
fDate
1998
Firstpage
807
Lastpage
810
Abstract
The measurements of field emission characteristics and the observation of generation, variation or elimination of emission points of amorphous diamond films deposited by filtered cathodic vacuum arc (FCVA) technique have been described in this paper. A linear model is proposed to interpret the experiment results also
Keywords
amorphous semiconductors; diamond; electron field emission; elemental semiconductors; plasma arc sprayed coatings; semiconductor thin films; C; amorphous diamond films; electron emission; emission points; filtered cathodic vacuum arc technique; linear model; Amorphous materials; Anodes; Cathodes; Conducting materials; Electron emission; Laboratories; Phosphors; Substrates; Vacuum technology; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-4306-9
Type
conf
DOI
10.1109/ICSICT.1998.786160
Filename
786160
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