Title :
Observation and explanation of electron emission from amorphous diamond films
Author :
Jingfang, Xu ; Qiong, Li ; Zhong, Fan ; Jiangyun, Zhou ; Dongsheng, Mao ; Kang, W.P. ; Davidson, J.L.
Author_Institution :
Dept. of Electron. Sci. & Technol., ECNU, Shanghai, China
Abstract :
The measurements of field emission characteristics and the observation of generation, variation or elimination of emission points of amorphous diamond films deposited by filtered cathodic vacuum arc (FCVA) technique have been described in this paper. A linear model is proposed to interpret the experiment results also
Keywords :
amorphous semiconductors; diamond; electron field emission; elemental semiconductors; plasma arc sprayed coatings; semiconductor thin films; C; amorphous diamond films; electron emission; emission points; filtered cathodic vacuum arc technique; linear model; Amorphous materials; Anodes; Cathodes; Conducting materials; Electron emission; Laboratories; Phosphors; Substrates; Vacuum technology; Voltage;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
DOI :
10.1109/ICSICT.1998.786160
