Title :
Application of Plasma Charging Probe to Production HDP CVD Tool
Author :
Roche, G.A. ; McVittie, J.P.
Author_Institution :
Lam Research Corporation
Keywords :
Current measurement; EPROM; Plasma applications; Plasma devices; Plasma measurements; Probes; Production; Radio frequency; Steady-state; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715205
