DocumentCode :
3069583
Title :
Bidirectional matched global bit line scheme for high density DRAMs
Author :
Ahn, J.H. ; Kim, T.H. ; Park, S.M. ; Wang, S.H. ; Hee-Gook Lee
Author_Institution :
Res. & Dev. Lab., GoldStar Electron Co. Ltd., Seoul, South Korea
fYear :
1993
fDate :
19-21 May 1993
Firstpage :
91
Lastpage :
92
Abstract :
A new bit line organization, called Bidirectional Matched Global Bit Line (BMGB) scheme, is designed to overcome the difficulties in layout implementation and the high susceptibility to noise of conventional open bit line structure. In this scheme, the local bit line pairs are placed close to each other and well-balanced folded bit line type global bit lines are used. Measured results from a test chip, processed with 0.35 /spl mu/m technology, shows that cell array size can be reduced about 15%, while a similar performance is obtained to that of a conventional folded bit line architecture. This scheme can also be used with folded type local bit lines.
Keywords :
DRAM chips; MOS integrated circuits; VLSI; 0.35 micron; bidirectional matched global bit line scheme; dynamic RAM; folded bit line type global bit lines; folded type local bit lines; high density DRAMs; DRAM chips; MOS integrated circuits, memory; Very-large-scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Circuits, 1993. Digest of Technical Papers. 1993 Symposium on
Conference_Location :
Kyoto, Japan
Type :
conf
DOI :
10.1109/VLSIC.1993.920552
Filename :
920552
Link To Document :
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