Title :
Analytical Circuit Model Approach to Charging Damage in Plasma/implantation Processing
Author :
En, William G. ; Shich, B.P. ; Cheung, Nathan W.
Author_Institution :
University of California, Berkeley
Keywords :
Analytical models; Circuit analysis; Electrons; Plasma density; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Plasma measurements; Plasma simulation; Plasma temperature;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715206
