DocumentCode
3069691
Title
Analytical Circuit Model Approach to Charging Damage in Plasma/implantation Processing
Author
En, William G. ; Shich, B.P. ; Cheung, Nathan W.
Author_Institution
University of California, Berkeley
fYear
1996
fDate
13-14 May 1996
Firstpage
77
Lastpage
80
Keywords
Analytical models; Circuit analysis; Electrons; Plasma density; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Plasma measurements; Plasma simulation; Plasma temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715206
Filename
715206
Link To Document