DocumentCode
3070084
Title
Electronic switching in amorphous silicon devices: properties of the conducting filament
Author
Owen, A.E. ; Hu, J. ; Hajto, J. ; Snell, A.J.
Author_Institution
Dept. of Electr. Eng., Edinburgh Univ., UK
fYear
1998
fDate
1998
Firstpage
830
Lastpage
833
Abstract
It has been amply demonstrated that non-volatile memory switching in metal-hydrogenated amorphous silicon-metal structures is crucially dependent on the formation of a conducting filament during the very first switching operation. In this paper we review the evidence which shows that the filament is an inclusion in the amorphous silicon made up of metallic particles from the top contact dispersed in an insulating matrix and that its critical dimensions are on the scale of nanometres. Particular attention is given to recent work on metal nonmetal transitions and a dielectric anomaly associated with the filament. These and earlier experiments all provide consistent evidence for the mesoscopic dimensions of the active filament region in which switching occurs
Keywords
amorphous semiconductors; elemental semiconductors; hydrogen; metal-insulator transition; metal-semiconductor-metal structures; random-access storage; semiconductor switches; silicon; Si:H; active filament region; amorphous silicon devices; conducting filament; dielectric anomaly; insulating matrix; metal nonmetal transitions; metallic particles; nonvolatile memory switching; Amorphous materials; Amorphous silicon; Buildings; Chemicals; Dielectrics and electrical insulation; Nanometers; Nonvolatile memory; Temperature; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-4306-9
Type
conf
DOI
10.1109/ICSICT.1998.786197
Filename
786197
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