DocumentCode :
3070084
Title :
Electronic switching in amorphous silicon devices: properties of the conducting filament
Author :
Owen, A.E. ; Hu, J. ; Hajto, J. ; Snell, A.J.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
fYear :
1998
fDate :
1998
Firstpage :
830
Lastpage :
833
Abstract :
It has been amply demonstrated that non-volatile memory switching in metal-hydrogenated amorphous silicon-metal structures is crucially dependent on the formation of a conducting filament during the very first switching operation. In this paper we review the evidence which shows that the filament is an inclusion in the amorphous silicon made up of metallic particles from the top contact dispersed in an insulating matrix and that its critical dimensions are on the scale of nanometres. Particular attention is given to recent work on metal nonmetal transitions and a dielectric anomaly associated with the filament. These and earlier experiments all provide consistent evidence for the mesoscopic dimensions of the active filament region in which switching occurs
Keywords :
amorphous semiconductors; elemental semiconductors; hydrogen; metal-insulator transition; metal-semiconductor-metal structures; random-access storage; semiconductor switches; silicon; Si:H; active filament region; amorphous silicon devices; conducting filament; dielectric anomaly; insulating matrix; metal nonmetal transitions; metallic particles; nonvolatile memory switching; Amorphous materials; Amorphous silicon; Buildings; Chemicals; Dielectrics and electrical insulation; Nanometers; Nonvolatile memory; Temperature; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
Type :
conf
DOI :
10.1109/ICSICT.1998.786197
Filename :
786197
Link To Document :
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