Title :
Plasma Charging and Damage Evaluation of Reactive Ion Etching using Surface Photovoltage Technique and Corona Pulsed Deep Depletion Technique
Author :
Nagalingam, Samuel ; Fung, Min-Su ; Thind, Satch
Author_Institution :
Silicon Systems. Inc.
Keywords :
Annealing; Corona; Etching; Plasma applications; Plasma measurements; Plasma temperature; Pollution measurement; Pulse measurements; Silicon; Surface charging;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715209
