Title :
The Effect of Guard Line on Plasma Damage
Author :
Heo, Yeon-Cheol ; Park, Byung Gook ; Lee, Jong Duk
Author_Institution :
Hyundai Electronics Industries Co., Ltd.
Keywords :
Diodes; Etching; Leakage current; MOS capacitors; Plasma applications; Plasma devices; Plasma materials processing; Protection; Stress; Testing;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715211
