Title :
Phase transitions, curve evolution, and the control of semiconductor manufacturing processes
Author :
Berg, Jordan ; Yezzi, Anthony ; Tannenbaum, Allen
Author_Institution :
Inst. for Math. & Applications, Minnesota Univ., Minneapolis, MN, USA
Abstract :
This paper presents a strategy for the estimation and control of certain semiconductor manufacturing processes, employing models developed to describe the dynamics of material interfaces in phase transition problems. Previous work has successfully applied similar models to predict surface evolution in etching and deposition. Here, we propose to adapt these techniques to real-time process monitoring and control. The testbed for algorithm development is a highly simplified model of a plasma etch. Key elements of the scheme are investigated, and found to be feasible
Keywords :
phase transformations; process control; real-time systems; semiconductor device manufacture; curve evolution; deposition; etching; phase transitions; real-time process control; real-time process monitoring; semiconductor manufacturing process control; surface evolution; Etching; Manufacturing processes; Monitoring; Phase estimation; Plasma applications; Plasma materials processing; Predictive models; Process control; Semiconductor materials; Testing;
Conference_Titel :
Decision and Control, 1996., Proceedings of the 35th IEEE Conference on
Conference_Location :
Kobe
Print_ISBN :
0-7803-3590-2
DOI :
10.1109/CDC.1996.573677
