DocumentCode :
3071122
Title :
Process-Induced Charge Damage in PETEOS for Interlevel Dielectric Applications
Author :
Denton, H. ; Grynkewich, G. ; Ilderem, V. ; Lin, F. ; Parris, P. ; Shin, H.C.
Author_Institution :
Advanced Custom Technologies, Motorola Inc.
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
109
Lastpage :
112
Keywords :
Breakdown voltage; Degradation; Dielectrics; Plasma accelerators; Plasma applications; Plasma chemistry; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Sputter etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715214
Filename :
715214
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3071122
بازگشت