DocumentCode :
3071977
Title :
Minimizing Mobile Ion Damage during the Ash Process
Author :
Shi, J. ; Rounds, S. ; Noble, T. ; DeSarno, M. ; Fink, S. ; Shaner, D. ; Stants, H.
Author_Institution :
Fusion Semiconductor Systems
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
124
Lastpage :
126
Keywords :
Ash; Contamination; Fusion power generation; Plasma applications; Plasma devices; Plasma measurements; Plasma temperature; Probes; Radio frequency; Resists;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715218
Filename :
715218
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3071977
