DocumentCode
3072375
Title
Plasma Etching Induced Damage to Strained Si/SiGe/Si heterostructure
Author
Swain, P.K. ; Misra, D. ; Cole, M.
Author_Institution
New Jersey Institute of Technology
fYear
1996
fDate
13-14 May 1996
Firstpage
133
Lastpage
136
Keywords
Annealing; Capacitive sensors; Dry etching; Germanium silicon alloys; Photonic band gap; Plasma applications; Silicon germanium; Spectroscopy; Transmission electron microscopy; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715221
Filename
715221
Link To Document