DocumentCode :
3072375
Title :
Plasma Etching Induced Damage to Strained Si/SiGe/Si heterostructure
Author :
Swain, P.K. ; Misra, D. ; Cole, M.
Author_Institution :
New Jersey Institute of Technology
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
133
Lastpage :
136
Keywords :
Annealing; Capacitive sensors; Dry etching; Germanium silicon alloys; Photonic band gap; Plasma applications; Silicon germanium; Spectroscopy; Transmission electron microscopy; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715221
Filename :
715221
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3072375
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