Title :
High performance long wavelength strained layer InGaAs/InP quantum well lasers
Author :
Tanbun-Ek, T. ; Logan, R. ; Olsson, N. ; Temkin, H. ; Sergent, A. ; Wecht, K.
Author_Institution :
AT&T Bell Lab., Murray Hill, NJ, USA
Abstract :
Strained-layer quantum-well InGaAsP/InP lasers emitting at wavelengths between 1.47 and 1.55 mu m are reported. The lasing wavelength could be adjusted by introducing either tensile or compressive strain as well as by changing the layer thickness of the quantum wells. To obtain a lasing wavelength as short as 1.47 mu m, tensile strain is preferable due to the relaxed constraints in layer thickness of the quantum wells. Both tensile and compressive strain were found to improve the performance of the lasers as compared to the lattice-matched ones. A sample with compressive strain showed a CW threshold current as low as 4 mA. Maximum CW output power as high as 206 mW with a lasing wavelength of 1.47 mu m was obtained from a quantum-well active layer with tensile strain.<>
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; semiconductor growth; semiconductor junction lasers; vapour phase epitaxial growth; 1.47 micron; 1.55 micron; 206 mW; 4 mA; CW threshold current; InGaAsP-InP strained layer quantum well lasers; MOVPE; QW lasers; compressive strain; lasing wavelength; long wavelength quantum well lasers; maximum CW output power; metalorganic vapour phase epitaxy; semiconductor; tensile strain; Indium gallium arsenide; Indium phosphide; Interpolation; Lattices; Mass spectroscopy; Pareto analysis; Photonic band gap; Quantum well lasers; Threshold current; Waveguide lasers;
Conference_Titel :
Indium Phosphide and Related Materials, 1990. Second International Conference.
Conference_Location :
Denver, CO, USA
DOI :
10.1109/ICIPRM.1990.203008