Title :
Research on the effect of inorganic components on brightener in horizontal pulse plating solution by Cyclic Voltammetric Stripping method
Author :
Minjie Ning ; Wei He ; Xianzhong Tang ; Zhihua Tao ; Xuemei He ; Lin Xiang ; Yongshuan Hu ; Xinhong Su ; Shigang Cheng
Author_Institution :
Inst. of Microelectron. & Solid State Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
The effect of Fe3+, Cu2+ and Cl- with different concentration on the electro-deposition process of Cu in the medium of CuSO4-H2SO4 with platinum as work electrode has been studied by CVS (Cyclic Voltammetric Stripping) method and the assay value of brightener is also studied. The research results show that different concentration of Fe3+, Cu2+ and CL- affects the assay value of brightener to some extent, the brightener´s extreme concentration value change are RFe3+=10.33ml/l, RCL-=1.22ml/l, RCu2+=3.1ml/l respectively, the concentration of Fe3+ has the greatest influence on brightener concentration measurement. So, the effect of Fe3+ should be taken into consideration with CVS analyzer to monitor the concentration of brightener in electroplating solution. The study result is of some reference and guiding significance for the electroplating liquid composition control and production process.
Keywords :
electroplating; brightener concentration measurement; cyclic voltammetric stripping method; electrodeposition process; electroplating liquid composition control; electroplating solution; horizontal pulse plating solution; inorganic components; production process; Additives; Argon; Copper; Electrodes; Monitoring; Platinum; Production; Brightener; CVS; Electroplating liquid; Organic additives;
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2012 7th International
Conference_Location :
Taipei
Print_ISBN :
978-1-4673-1635-4
Electronic_ISBN :
2150-5934
DOI :
10.1109/IMPACT.2012.6420216