DocumentCode
3073089
Title
A 1 Gb SDRAM with ground level precharged bitline and non-boosted 2.1 V word line
Author
Eto, S. ; Matsumiya, M. ; Takita, M. ; Ishii, Y. ; Nakamura, T. ; Kawabata, K. ; Kano, H. ; Kitamoto, A. ; Ikeda, T. ; Koga, T. ; Higashiho, M. ; Serizawa, Y. ; Itabashi, K. ; Tsuboi, O. ; Yokoyama, Y. ; Taguchi, M.
Author_Institution
Fujitsu Labs. Ltd., Kawasaki, Japan
fYear
1998
fDate
5-7 Feb. 1998
Firstpage
82
Lastpage
83
Abstract
A dramatic reduction of the internal operating voltage and a high-speed clocking technique are the keys to low-power, high-speed memory technologies. When the memory core supply voltage is reduced to below 1.8 V, the electrical performance significantly degrades in two ways. First, sensing speed slows due to the noticeable threshold voltage of source-floated transistors. Second, the necessity of a relatively high Vpp voltage for the word lines may require a tripler-pumping circuit that significantly increases power. In this 1 Gb synchronous DRAM, the bitline precharge level is Vss (ground). The word line reset level is -0.5 V to prevent cell leakage current while reducing the threshold voltage of pass transistors and thus to eliminate word line boosting. Power consumption is thus decreased since inefficient tripler boosting is no longer necessary. This technology is also suitable for merged DRAM and logic circuits.
Keywords
DRAM chips; clocks; leakage currents; memory architecture; -0.5 V; 1 Gbit; 2.1 V; SDRAM; cell leakage current; ground level precharged bitline; high-speed clocking technique; high-speed memory technologies; internal operating voltage; memory core supply voltage; nonboosted word line; pass transistors; sensing speed; synchronous DRAM; threshold voltage; tripler-pumping circuit; Boosting; Circuits; Clocks; Degradation; Energy consumption; Leakage current; Random access memory; SDRAM; Threshold voltage; Variable structure systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 1998. Digest of Technical Papers. 1998 IEEE International
Conference_Location
San Francisco, CA, USA
ISSN
0193-6530
Print_ISBN
0-7803-4344-1
Type
conf
DOI
10.1109/ISSCC.1998.672385
Filename
672385
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