DocumentCode :
3073468
Title :
Modeling interconnect behavior with a calibrated FEM model
Author :
Strong, Alvin ; Chen, Fen
Author_Institution :
IBM Corp., Essex Junction, VT, USA
fYear :
2004
fDate :
18-21 Oct. 2004
Firstpage :
59
Lastpage :
63
Abstract :
As dimensions continue to shrink and device densities increase, power and heat dissipation become an ever-increasing challenge. In this work, we investigate heat flow ramifications for a variety of very simple patterns. We start by describing the use of a finite element method (FEM) tool. This includes a brief description of the modeling procedure. The model results, for a given set of boundary conditions, are then compared to the physical measurements for that structure. Excellent agreement is demonstrated, thus calibrating the model. We then extend this model to structures for which we have no physical measurements. As importantly, we extend this model to structures and patterns that may be desirable for the next generation.
Keywords :
finite element analysis; heat transfer; integrated circuit interconnections; integrated circuit modelling; FEM tool; calibrated FEM model; finite element method; heat dissipation; heat flow; heat transfer; interconnect behavior modeling; power dissipation; Boundary conditions; Buildings; Extraterrestrial measurements; Finite element methods; Rivers; Shape; Silicon compounds; Temperature; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2004 IEEE International
Print_ISBN :
0-7803-8517-9
Type :
conf
DOI :
10.1109/IRWS.2004.1422740
Filename :
1422740
Link To Document :
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