DocumentCode :
3073474
Title :
Fundamental Aspects of Plasma-induced Radiation Damage Of SiO2/Si - A Review -
Author :
Mizutani, Tatsumi
Author_Institution :
R&D Center, Hitachi Kasado Works
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
157
Lastpage :
159
Keywords :
Capacitance-voltage characteristics; Channel bank filters; Dielectrics and electrical insulation; Electron beams; Ion beams; Kinetic energy; Particle beams; Plasma measurements; Plasma sources; Plasma temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715227
Filename :
715227
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3073474
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