DocumentCode :
3073658
Title :
Gate Material Dependence Of Process Charging Damage In Thin Gate Oxide
Author :
Acovic, A. ; Ray, A. ; Sun, J. ; Herman, J. ; Furukawa, T. ; Geiger, R. ; Beyer, K. ; McGahay, V. ; Greco, S. ; Abadeer, W.
Author_Institution :
IBM Microelectronics
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
160
Lastpage :
163
Keywords :
Antenna measurements; CMOS technology; Capacitors; Design for quality; Dielectric measurements; FETs; MOSFET circuits; Microelectronics; Plasma applications; Plasma materials processing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715228
Filename :
715228
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3073658
