DocumentCode :
3074543
Title :
The Evaluation of Plasma Damage on N20 Oxide and Pure Oxide
Author :
Yoon, Jaeseog ; Lee, Sangdon ; Kim, Bongryul
Author_Institution :
Yonsei University
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
181
Lastpage :
183
Keywords :
Etching; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Plasma properties; Plasma temperature; Stress; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715233
Filename :
715233
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3074543
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