DocumentCode :
3074925
Title :
Thin-Oxide Charging Damage to Microelectronic Test Structures in an Electron-Cyclotron-Resonance Plasma
Author :
Friedmann, J.B. ; Shohet, J.L. ; McVitie, J.P. ; Ma, S.M.
Author_Institution :
NEC Corporation
fYear :
1996
fDate :
14-14 May 1996
Firstpage :
188
Lastpage :
191
Keywords :
Electrons; MOS capacitors; Microelectronics; Plasma applications; Plasma materials processing; Plasma measurements; Plasma sources; Probes; Programmable logic arrays; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715235
Filename :
715235
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3074925
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