Title :
An efficient PC-based preferential-etch simulator using dynamic cellular automata method
Author :
Zhu, Zhenjun ; Liu, Chang
Author_Institution :
Illinois Univ., Urbana, IL, USA
Abstract :
We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model. The program provides accurate modeling of etching process with high spatial resolution. Implementation of a dynamic CA technique has resulted in increased simulation speed and reduced memory requirements. A first ACES software based on PC platforms has been realized
Keywords :
cellular automata; etching; micromachining; semiconductor process modelling; ACES software; MEMS CAD; PC-based preferential-etch simulator; anisotropic etching simulation program; continuous cellular automata model; dynamic cellular automata method; high spatial resolution; micromachining; reduced memory requirements; Anisotropic magnetoresistance; Crystallization; Etching; Lattices; Micromechanical devices; Rough surfaces; Spatial resolution; Stochastic resonance; Substrates; Surface roughness;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
DOI :
10.1109/ICSICT.1998.786535
