DocumentCode
3076041
Title
Plasma Damage Characterization of the Decoupled Plasma Source (DPS) Reactor
Author
Krishnan, Sridhar ; Hallet, Bernard ; Schell, J.
Author_Institution
Texas Instruments
fYear
1996
fDate
14-14 May 1996
Firstpage
215
Lastpage
218
Keywords
Etching; Inductors; Instruments; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sheaths; Plasma sources; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location
Santa Clara, CA, USA
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715241
Filename
715241
Link To Document