Title :
Plasma Damage Characterization of the Decoupled Plasma Source (DPS) Reactor
Author :
Krishnan, Sridhar ; Hallet, Bernard ; Schell, J.
Author_Institution :
Texas Instruments
Keywords :
Etching; Inductors; Instruments; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sheaths; Plasma sources; Radio frequency;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715241
