• DocumentCode
    3076212
  • Title

    Plasma Etching Process Induced Closed-loop Metal Pattern Damage

  • Author

    Chu, Po-Tao ; Yeh, Ming-Chieh ; Hung, Chih-Chien ; Lin, Ting-Huang ; Chao, Ying-Chen

  • Author_Institution
    Taiwan Scmiconductor manufacturing Company
  • fYear
    1996
  • fDate
    13-14 May 1996
  • Firstpage
    219
  • Lastpage
    222
  • Keywords
    Etching; Fuses; Integrated circuit interconnections; Plasma applications; Plasma density; Plasma materials processing; Plasma temperature; Random access memory; Resists; Scanning electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1996 1st International Symposium on
  • Print_ISBN
    0-9651577-0-9
  • Type

    conf

  • DOI
    10.1109/PPID.1996.715242
  • Filename
    715242
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3076212