Title :
Quantitative Analysis of Etching Damage in the Highly-Selective Oxide Etching
Author :
Yagi, Kiyomi ; Matsui, Miyako ; Uchida, Fujihiko ; Tokunaga, Takafumi
Author_Institution :
Hitachi Ltd.
Keywords :
Chemistry; Contact resistance; Crystallization; Dry etching; Helium; Leakage current; Semiconductor films; Spectroscopy; Substrates; Wet etching;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715243
