DocumentCode
3077099
Title
Dielectric property of BaTiO3-SrTiO3 artificially modulated structure made by MBE
Author
Tsurumi, T. ; Miyasou, T. ; Ishibashi, Y. ; Ohashi, N.
Author_Institution
Dept. of Inorg. Mater., Tokyo Inst. of Technol., Japan
fYear
1998
fDate
1998
Firstpage
47
Lastpage
50
Abstract
In order to elucidate the origin of the asymmetry observed in the D-E or C-V hysteresis loops of BaTiO3(BTO)-SrTiO3(STO) epitaxial films, “artificially modulated structures” (AMSs), where the chemical composition was continuously changed along the direction of film thickness, were prepared and their dielectric properties were measured. A fully automatic molecular beam epitaxy system was developed to fabricate AMSs. The simulation of XRD profiles indicated that a relaxation of the crystal lattice occurred along the a-axis in the two AMSs. It was observed that the asymmetry of the C-V hysteresis loop was changed by the modulation, and that the origin of the asymmetry was attributed to the lattice relaxation rather than the asymmetry of the stress field
Keywords
X-ray diffraction; barium compounds; dielectric hysteresis; dielectric relaxation; epitaxial layers; ferroelectric materials; ferroelectric thin films; molecular beam epitaxial growth; strontium compounds; BaTiO3-SrTiO3; BaTiO3-SrTiO3 artificially modulated structure; C-V hysteresis loop; MBE; chemical composition; crystal lattice; dielectric property; film thickness; lattice relaxation; relaxation; Capacitance-voltage characteristics; Chemical technology; Dielectrics; Fabrication; Ferroelectric materials; Hysteresis; Lattices; Molecular beam epitaxial growth; Stress; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on
Conference_Location
Montreux
ISSN
1099-4734
Print_ISBN
0-7803-4959-8
Type
conf
DOI
10.1109/ISAF.1998.786633
Filename
786633
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