DocumentCode :
3077567
Title :
Chemical solution deposition of Pb(Mg1/3Nb2/3)O3 thin film with PbTiO 3 seeding layers through alkoxide route
Author :
Suzuki, H. ; Suzuki, K. ; Kamei, H. ; Ishikawa, K. ; Ota, T. ; Takahashi, Masaharu
Author_Institution :
Dept. of Mater. Sci., Shizuoka Univ., Hamamatsu, Japan
fYear :
1998
fDate :
1998
Firstpage :
143
Lastpage :
146
Abstract :
Ferroelectric relaxor Pb(Mg1/3Nb2/3)O3 (hereafter abbreviated as PMN) thin films were prepared by the chemical solution deposition from molecular-designed alkoxides precursor solutions with PbTiO3 (hereafter abbreviated as PT) multi-seeding layers. Alkoxide-derived PT seeding layer crystallized into a perovskite phase at low-temperatures above 450°C which offers the in-situ nucleation sites for PMN. In this study, crystallization behavior was controlled by using the seeding process and by changing the annealing process and the stacking structures of precursor thin films. As a result, multilayer perovskite PMN thin films with seeding layers of PT could be successfully prepared at 800°C (multi-seeding process). Relative permittivity of the resultant film was in the range from 1000 to 3500 at room temperature, depending upon the film thickness, annealing process and the stacking structures of multilayer thin films. The Curie temperatures of the resultant films also changed by the deposition process and the stacking structures of multilayer to form the compositional gradient
Keywords :
annealing; crystallisation; ferroelectric Curie temperature; ferroelectric thin films; lead compounds; magnesium compounds; multilayers; nucleation; sol-gel processing; 293 K; Curie temperatures; PMN; Pb(Mg1/3Nb2/3)O3 thin film; PbMgO3NbO3; PbTiO3; alkoxide route; annealing process; chemical solution deposition; compositional gradient; crystallization; ferroelectric relaxor thin films; multilayer; nucleation; perovskite phase; room temperature; seeding layers; sol-gel process; stacking structures; Annealing; Chemicals; Crystallization; Ferroelectric materials; Niobium; Nonhomogeneous media; Permittivity; Sputtering; Stacking; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on
Conference_Location :
Montreux
ISSN :
1099-4734
Print_ISBN :
0-7803-4959-8
Type :
conf
DOI :
10.1109/ISAF.1998.786656
Filename :
786656
Link To Document :
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