DocumentCode :
3078308
Title :
Dielectric and electromechanical properties of PbNi1/3Nb 2/3O3-PbTiO3-PbZrO3 system: a processing-property study
Author :
Cornejo, I.A. ; Jadidian, B. ; Akdogan, E.K. ; Safari, A.
Author_Institution :
Dept. of Ceramics & Mater. Eng., Rutgers Univ., Piscataway, NJ, USA
fYear :
1998
fDate :
1998
Firstpage :
337
Lastpage :
340
Abstract :
The processing-property relationship in the system xPbNi1/3 Nb2/3O3-(1-x)[yPbTiO3-(1-y)PbZrO 3] (PNN-PT-PZ), with 0.4⩽x⩽0.6 and 0.6⩽y⩽0.8, were investigated. Samples were processed by three different routes: direct reaction of the oxide constituents, Columbite precursor process, and the PNN-perovskite mixing route. Calcination and sintering studies were carried out at different temperatures for 1-8 hours under controlled PbO atmospheres. Phase evolution was monitored by powder x-ray diffraction (XRD). Scanning electron microscopy (SEM) was used for microstructural characterization. Maxima in the dielectric and electromechanical properties were obtained for samples with x=0.5 and y=0.7 that were sintered at 1200°C. At room temperature, the highest dielectric constant was 6400 with a dissipation factor of 2%. These samples exhibit strong electromechanical coupling, kt=58 and kp=77%. The piezoelectric charge coefficient (d33) of an optimum composition was found to be 820 pC/N
Keywords :
X-ray diffraction; heat treatment; lead compounds; materials preparation; permittivity; piezoceramics; scanning electron microscopy; sintering; 1200 degC; 20 degC; Columbite precursor process; PNN-perovskite mixing; PbNiO3NbO3-PbTiO3-PbZrO3 ; SEM; calcination; dielectric constant; dissipation factor; electromechanical coupling; piezoelectric charge coefficient; powder X-ray diffraction; sintering; Atmosphere; Calcination; Dielectrics; Monitoring; Niobium; Powders; Scanning electron microscopy; Temperature control; X-ray diffraction; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on
Conference_Location :
Montreux
ISSN :
1099-4734
Print_ISBN :
0-7803-4959-8
Type :
conf
DOI :
10.1109/ISAF.1998.786702
Filename :
786702
Link To Document :
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