DocumentCode
3079928
Title
Pulse shortening in high power microwave sources
Author
Benford, J. ; Benford, G.
Author_Institution
Physics Int. Co., San Leandro, CA, USA
fYear
1996
fDate
3-5 June 1996
Firstpage
230
Abstract
Summary form only given. We review the current state of understanding of the universal phenomena that high power microwave pulses are shorter than the applied electrical pulse. Higher power reduces pulse duration, limiting present-day sources to a few hundred joules. Is this limitation fundamental, or are there means to avoid it entirely? There is no reason to think that only one mechanism is responsible. Rather, there are layers of effects which may need to be addressed separately. We categorize experimental observations in terms of candidate pulse shortening mechanisms such as gap closure, primary and secondary electron bombardment of walls, and RF breakdown. Pulse shortening mechanism theory (microwave field interaction with the beam, resistive filamentation, enhanced closure, etc.) is summarized and compared to observations. We make suggestions for additional experiments and diagnostics to help separate out causes. Finally, means of reducing or eliminating pulse shortening are reviewed.
Keywords
microwave generation; RF breakdown; applied electrical pulse; diagnostics; enhanced closure; gap closure; high power microwave sources; microwave field interaction; primary electron bombardment; pulse duration; pulse shortening; pulse shortening mechanisms; resistive filamentation; secondary electron bombardment; Electric breakdown; Electron beams; Geometry; Magnetic field measurement; Microwave devices; Microwave oscillators; Physics; Plasma measurements; Space vector pulse width modulation; Vacuum breakdown;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location
Boston, MA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3322-5
Type
conf
DOI
10.1109/PLASMA.1996.551437
Filename
551437
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