• DocumentCode
    3080212
  • Title

    High Q-factor hydrogenated amorphous silicon microdisk resonators

  • Author

    Lipka, T. ; Amthor, J. ; Krueckel, C. ; Müller, J.

  • Author_Institution
    Inst. of Microsyst. Technol., Hamburg Univ. of Technol., Hamburg, Germany
  • fYear
    2012
  • fDate
    2-6 July 2012
  • Firstpage
    873
  • Lastpage
    874
  • Abstract
    We report about the fabrication and optical characterization of high Q hydrogenated amorphous silicon microdisk resonators in telecommunication C-band. High resonance peaks of >;30dB were achieved. Intrinsic Q-factors of 0.9×106 were measured with >;10dB extinction for qTM-modes.
  • Keywords
    Q-factor; amorphous semiconductors; elemental semiconductors; extinction coefficients; hydrogen; micro-optomechanical devices; microfabrication; micromechanical resonators; optical fabrication; optical resonators; silicon; Si:H; extinction ratio; high Q-factor hydrogenated amorphous silicon microdisk resonators; intrinsic Q-factors; optical characterization; optical fabrication; qTM-modes; resonance peaks; telecommunication C-band; Couplings; Extinction ratio; Fabrication; Optical resonators; Optical waveguides; Photonics; Q factor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Opto-Electronics and Communications Conference (OECC), 2012 17th
  • Conference_Location
    Busan
  • ISSN
    2166-8884
  • Print_ISBN
    978-1-4673-0976-9
  • Electronic_ISBN
    2166-8884
  • Type

    conf

  • DOI
    10.1109/OECC.2012.6276673
  • Filename
    6276673
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3080212