DocumentCode :
3080212
Title :
High Q-factor hydrogenated amorphous silicon microdisk resonators
Author :
Lipka, T. ; Amthor, J. ; Krueckel, C. ; Müller, J.
Author_Institution :
Inst. of Microsyst. Technol., Hamburg Univ. of Technol., Hamburg, Germany
fYear :
2012
fDate :
2-6 July 2012
Firstpage :
873
Lastpage :
874
Abstract :
We report about the fabrication and optical characterization of high Q hydrogenated amorphous silicon microdisk resonators in telecommunication C-band. High resonance peaks of >;30dB were achieved. Intrinsic Q-factors of 0.9×106 were measured with >;10dB extinction for qTM-modes.
Keywords :
Q-factor; amorphous semiconductors; elemental semiconductors; extinction coefficients; hydrogen; micro-optomechanical devices; microfabrication; micromechanical resonators; optical fabrication; optical resonators; silicon; Si:H; extinction ratio; high Q-factor hydrogenated amorphous silicon microdisk resonators; intrinsic Q-factors; optical characterization; optical fabrication; qTM-modes; resonance peaks; telecommunication C-band; Couplings; Extinction ratio; Fabrication; Optical resonators; Optical waveguides; Photonics; Q factor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2012 17th
Conference_Location :
Busan
ISSN :
2166-8884
Print_ISBN :
978-1-4673-0976-9
Electronic_ISBN :
2166-8884
Type :
conf
DOI :
10.1109/OECC.2012.6276673
Filename :
6276673
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3080212
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