DocumentCode :
3080275
Title :
Silicon photonic components for integrated optical systems
Author :
Walavalkar, Sameer ; Homyk, Andrew ; Kim, Se-Heon ; Scherer, Axel
Author_Institution :
Caltech, Pasadena, CA, USA
fYear :
2012
fDate :
2-6 July 2012
Firstpage :
879
Lastpage :
880
Abstract :
We show that the properties of silicon can be changed profoundly when nanofabricated to below 5nm, resulting in larger bandgap emission and more efficient light generation. Moreover, three-dimensional nanostructures can be fabricated at these nanoscale dimensions by dynamic control over the dry etching process.
Keywords :
integrated optics; nanofabrication; nanophotonics; silicon; bandgap emission; dry etching process; dynamic control; integrated optical systems; light generation; nanofabricated; silicon photonic components; three-dimensional nanostructures; wavelength 5 nm; Electron beams; Fabrication; Nanoscale devices; Nanostructures; Oxidation; Silicon; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2012 17th
Conference_Location :
Busan
ISSN :
2166-8884
Print_ISBN :
978-1-4673-0976-9
Electronic_ISBN :
2166-8884
Type :
conf
DOI :
10.1109/OECC.2012.6276676
Filename :
6276676
Link To Document :
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