Title :
Monolayer graphene mode-locked 63-fs Ti:sapphire laser
Author :
Kim, Jun Wan ; Baek, In Hyung ; Lee, Hwang Woon ; Bae, Sukang ; Hong, Byung Hee ; Ahn, Yeong Hwan ; Yeom, Dong-Il ; Rotermund, Fabian
Author_Institution :
Dept. of Phys., Ajou Univ., Suwon, South Korea
Abstract :
Passive mode-locking of a Ti:sapphire laser employing monolayer graphene as saturable absorber was demonstrated for the first time. The large-area, high-quality monolayer graphene was fabricated by chemical vapor deposition method. Without any additional treatment, monolayer graphene shows ultrafast recovery time and nonlinear absorption properties appropriate for the bulk laser mode-locking near 800 nm. The graphene mode-locked Ti:sapphire laser delivers 63-fs pulses with a maximum output power of 480 mW.
Keywords :
chemical vapour deposition; laser mode locking; optical fabrication; optical films; sapphire; solid lasers; titanium; Al2O3:Ti; Ti:sapphire laser; chemical vapor deposition method; maximum output power; monolayer graphene; nonlinear absorption properties; passive mode-locking; saturable absorber; time 63 fs; ultrafast recovery time; Absorption; Chemical lasers; Fiber lasers; Laser mode locking; Photonics; Power generation;
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2012 17th
Conference_Location :
Busan
Print_ISBN :
978-1-4673-0976-9
Electronic_ISBN :
2166-8884
DOI :
10.1109/OECC.2012.6276785
