• DocumentCode
    3084360
  • Title

    Plasma enhancement of current from carbon cathodes for field emission displays

  • Author

    Amaratunga, G.A.J. ; Kong, Michael G. ; Silva, S.R.P.

  • Author_Institution
    Dept. of Electr. Eng. & Electron., Liverpool Univ., UK
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    244
  • Abstract
    Summary form only given. In this paper, we examine the possibility of using a background gas medium to enhance the current available from low threshold carbon cathodes. The field emission current is used to initiate a plasma in the gas medium, and thereby achieve a current multiplication effect. Results on the variation of anode current as a function of electric field and gas pressure are presented. These are compared with model calculations to verify the principles of operation. The influence of ion bombardment on the long term performance thin film carbon cathodes is examined for He and Ar multiplication plasmas. A measure of the influence of current multiplication on display quality is presented by examining light output from two standard low voltage phosphors. Also studied are the influence of doping the carbon with N to lower the threshold voltage for emission as well as the consequent impact on anode current from the plasma. In addition, microscopic surface roughness of the cathode and its impact on emission properties are examined. The results presented will provide an evaluation of a combined field emission-plasma switching approach to obtain flat panel displays with increased brightness, viewing angle and wider range of operation temperature.
  • Keywords
    cathodes; C; C:N; anode current; background gas medium; brightness; combined field emission-plasma switching approach; current multiplication effect; display quality; field emission current; field emission displays; flat panel displays; gas medium; gas pressure; ion bombardment; light output; long term performance; low threshold cathodes; low voltage phosphors; microscopic surface roughness; multiplication plasmas; operation temperature; plasma enhancement; threshold voltage; viewing angle; Anodes; Argon; Carbon dioxide; Cathodes; Flat panel displays; Helium; Plasma displays; Plasma measurements; Plasma temperature; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.551469
  • Filename
    551469