DocumentCode
3084576
Title
Interconnect performance modeling for 3D integrated circuits with multiple Si layers
Author
Souri, Shukri J. ; Saraswat, Krishna C.
Author_Institution
Dept. of Electr. Eng., Stanford Univ., CA, USA
fYear
1999
fDate
1999
Firstpage
24
Lastpage
26
Abstract
Long interconnect RC delay is increasing rapidly with chip size, limiting chip performance. 3D device integration in multiple layers of Si promises to increase transistor packing density and reduce RC time delay through reducing chip size. This paper offers a quantitative approach to compare current technology chip performance to that of 3D ICs
Keywords
delays; elemental semiconductors; integrated circuit interconnections; integrated circuit metallisation; integrated circuit modelling; semiconductor thin films; silicon; 3D ICs; 3D device integration; 3D integrated circuits; RC time delay; Si; chip performance; chip size; interconnect RC delay; interconnect performance modeling; multiple Si layers; transistor packing density; Delay effects; Delay estimation; Equations; Integrated circuit interconnections; Integrated circuit modeling; Joining processes; Logic; Stochastic processes; Three-dimensional integrated circuits; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology, 1999. IEEE International Conference
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-5174-6
Type
conf
DOI
10.1109/IITC.1999.787067
Filename
787067
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