• DocumentCode
    3085388
  • Title

    High electron mobility triangular InGaAs-OI nMOSFETs with (111)B side surfaces formed by MOVPE growth on narrow fin structures

  • Author

    Irisawa, T. ; Oda, Masaomi ; Ikeda, Ken-ichi ; Moriyama, Y. ; Mieda, E. ; Jevasuwan, W. ; Maeda, T. ; Ichikawa, Osamu ; Osada, Takenori ; Hata, Masaharu ; Miyamoto, Yutaka ; Tezuka, Taro

  • Author_Institution
    Collaborative Res. Team Green Nanoelectron. Center (GNC), AIST, Tsukuba, Japan
  • fYear
    2013
  • fDate
    9-11 Dec. 2013
  • Abstract
    Triangular In0.53Ga0.47As-OI nMOSFETs with smooth (111)B side surfaces on Si have been successfully fabricated. Triangular shaped channels with bottom width down to 30 nm were formed by MOVPE growth on narrow InGaAs-OI fins. The formed (111)B surface was demonstrated to provide higher mobility compared with reference InGaAs-OI tri-gate (1.9×) as well as bulk (100) InGaAs nMOSFETs (1.6×), which is possibly due to reduced Dit in conduction band and resultant suppressed carrier trapping at the MOS interface. Lower noise and hysteresis in triangular device supported this model. High Ion value of 930 μA/μm at Lg = 300 nm indicates the potential of the triangular InGaAs-OI nMOSFETs for ultra-low power and high performance CMOS applications.
  • Keywords
    CMOS integrated circuits; MOCVD; MOSFET; electron mobility; gallium arsenide; indium compounds; low-power electronics; oxygen compounds; vapour phase epitaxial growth; In0.53Ga0.47As-OI; InGaAs-OI; MOS interface; MOVPE growth; Si; conduction band; high electron mobility triangular nMOSFET; high performance CMOS applications; narrow fin structures; reference trigate; resultant suppressed carrier trapping; size 30 nm; smooth (111)B side surfaces; triangular shaped channels; ultra-low power applications; Epitaxial growth; Epitaxial layers; Indium gallium arsenide; MOSFET; Noise; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2013 IEEE International
  • Conference_Location
    Washington, DC
  • Type

    conf

  • DOI
    10.1109/IEDM.2013.6724542
  • Filename
    6724542