• DocumentCode
    3085712
  • Title

    Characterization and fabrication of SiOx nano-metric films, obtained by reactive sputtering

  • Author

    Alarcon-Salazar, J. ; Aceves-Mijares, M. ; Roman-Lopez, S. ; Falcony, Ciro

  • Author_Institution
    Dept. of Electron., INAOE, Tonanzintla Puebla, Mexico
  • fYear
    2012
  • fDate
    26-28 Sept. 2012
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    Nano-metric layers were obtained by reactive sputtering using different oxygen/argon (O/Ar) flow rates. Si and SiO targets were used to make SiOx films (x≤2) and these were annealed at three different temperatures, 600 °C, 900 °C and 1100 °C during 30 minutes, in N2 ambient. The samples were characterized by Null Ellipsometry, Fourier Transform Infra Red (FTIR) spectroscopy, Photoluminescence (PL) and Atomic Force Microscopy (AFM). Results show that the as deposited films are off stoichiometric silicon, which move towards stoichiometric SiO2 with annealing. Poor photoluminescence was found. Average roughness (Sa) was determined between 2 a 4 nm after thermal treatments (TT).
  • Keywords
    Fourier transform spectra; annealing; atomic force microscopy; infrared spectra; nanofabrication; nanostructured materials; photoluminescence; silicon compounds; sputter deposition; stoichiometry; surface roughness; thin films; AFM; FTIR spectroscopy; Fourier transform infrared spectroscopy; SiO2; SiOx nanometric film fabrication; annealing; atomic force microscopy; film deposition; film roughness; nanometric layer characterization; null ellipsometry; off stoichiometric silicon; oxygen-argon flow rates; photoluminescence; reactive sputtering; temperature 1100 degC; temperature 600 degC; temperature 900 degC; thermal treatments; time 30 min; Annealing; Argon; Films; Photoluminescence; Refractive index; Silicon; Sputtering; AFM; FTIR; PL; Si; SiO; TT;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Engineering, Computing Science and Automatic Control (CCE), 2012 9th International Conference on
  • Conference_Location
    Mexico City
  • Print_ISBN
    978-1-4673-2170-9
  • Type

    conf

  • DOI
    10.1109/ICEEE.2012.6421157
  • Filename
    6421157