DocumentCode :
3086088
Title :
Techniques towards GaN power transistors with improved high voltage dynamic switching properties
Author :
Wurfl, Joachim ; Hilt, O. ; Bahat-Treidel, E. ; Zhytnytska, R. ; Kotara, P. ; Brunner, Frank ; Krueger, O. ; Weyers, M.
Author_Institution :
Leibniz Inst. fur Hochstfrequenztechnik, Ferdinand-Braun-Inst., Berlin, Germany
fYear :
2013
fDate :
9-11 Dec. 2013
Abstract :
Dynamic switching limitations of GaN power devices are analyzed and techniques towards improving fast high voltage switching are proposed and verified experimentally with an emphasis on optimized epitaxial buffer designs. Normally-off and normally-on GaN transistors are presented; depending on specific technology the dynamic on-state resistance increase reduces to a factor of 2.5 for 500 V switching from off-state drain bias. Normally-off transistors using p-GaN gate technology demonstrated a RonxQg product of 0.4 ΩnC for switching at 400 V drain bias.
Keywords :
III-V semiconductors; gallium compounds; power integrated circuits; power transistors; wide band gap semiconductors; GaN power devices; GaN power transistors; dynamic on-state resistance; epitaxial buffer designs; high voltage dynamic switching properties; high voltage switching; normally-off GaN transistors; normally-on GaN transistors; off-state drain bias; p-GaN gate technology; voltage 400 V; voltage 500 V; Aluminum gallium nitride; Electric breakdown; Gallium nitride; Logic gates; Resistance; Switches; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
Type :
conf
DOI :
10.1109/IEDM.2013.6724571
Filename :
6724571
Link To Document :
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