Title :
Vacancy-modulated conductive oxide resistive RAM (VMCO-RRAM): An area-scalable switching current, self-compliant, highly nonlinear and wide on/off-window resistive switching cell
Author :
Govoreanu, B. ; Redolfi, A. ; Zhang, Leiqi ; Adelmann, C. ; Popovici, Mihaela ; Clima, S. ; Hody, Hubert ; Paraschiv, V. ; Radu, Iuliana P. ; Franquet, Alexandre ; Liu, J.-C. ; Swerts, Johan ; Richard, O. ; Bender, Hugo ; Altimime, L. ; Jurczak, Malgorzat
Author_Institution :
Imec, Leuven, Belgium
Abstract :
We report a novel self-compliant and self-rectifying resistive switching memory cell, with area-scalable switching currents, featuring a set current density of ~5nA/nm2 (<;9uA for a 40nm-size cell), high on-state half-bias nonlinearity of 102 and low reset current density of <;0.6nA/nm2 (<;1uA@40nm size). The cell can be operated at below ±4V/10ns, with a large on/off window of >102 and retention extrapolates to 10yr at 101°C. The switching stack is fully based on ALD processes, using common high-k dielectrics and has a thickness of <;10nm, meeting the 3D Vertical RRAM requirements. Moreover, we point out the nonlinearity-low-current operation interdependence and discuss the scaling potential of the areal switching RRAM for reliable sub-μA current operation in the 10nm-cell size realm.
Keywords :
atomic layer deposition; current density; high-k dielectric thin films; random-access storage; vacancies (crystal); 3D vertical RRAM requirements; ALD process; VMCO-RRAM; area-scalable switching current; areal switching RRAM; current density; high-k dielectrics; nonlinearity-low-current operation interdependence; on-state half-bias nonlinearity; scaling potential; self-rectifying resistive switching memory cell; switching stack; temperature 101 C; vacancy-modulated conductive oxide resistive RAM; wide on/off-window resistive switching cell; Aluminum oxide; Annealing; Computer architecture; Current density; Microprocessors; Resistance; Switches;
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
DOI :
10.1109/IEDM.2013.6724599