Ion-plasma surface polishing in HF-reactors

Summary form only given. This report is devoted to the development of the plasma-technological surface polishing of samples. The polishing surface treatment is carried out by the slipping ion flow, which is formed in the gas discharge by surface waves (SW). The type of the SW defines the effectivity of formation, energetical and angular parameters of ion flows. The characteristics of the SW must satisfy the following requirements. First, the wan disturbances must have a considerable tangential component of electric field. Second, excitation of this wave must be effective. Third, in order to obtain the uniform displacement of ions along the surface sputtered, the field must be maximally uniform and during the time of ions transit to the surface the running wave field variation must be small. Fourth, the SW must spend part of its energy, concentrated in plasma, in order to maintain the discharge. The ion-sound surface wave satisfies all these requirements.