DocumentCode :
3087347
Title :
Challenges in 3D memory manufacturing and process integration
Author :
Chandrasekaran, Nivedita
Author_Institution :
Micron Technol., Boise, ID, USA
fYear :
2013
fDate :
9-11 Dec. 2013
Abstract :
Memory industry transition from planar to 3D scaling and the introduction of several new emerging memory devices into manufacturing over the next decade is going to drive several new and unique manufacturing and process integration challenges. The inflection point we are faced with is a new paradigm where advancements in materials science, non-litho equipment technology, testing and characterization methods, and control methodologies will lead the way for scaling cadence.
Keywords :
DRAM chips; memory cards; quality control; reliability; 3D memory manufacturing; 3D scaling; materials science; memory industry transition; nonlitho equipment technology; process integration; Films; Manufacturing; Memory management; Random access memory; Three-dimensional displays; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
Type :
conf
DOI :
10.1109/IEDM.2013.6724621
Filename :
6724621
Link To Document :
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