DocumentCode :
3088212
Title :
High-performance flexible nanoelectronics: 2D atomic channel materials for low-power digital and high-frequency analog devices
Author :
Jongho Lee ; Hsiao-Yu Chang ; Tae-Jun Ha ; Huifeng Li ; Ruoff, Rodney S. ; Dodabalapur, Ananth ; Akinwande, Deji
Author_Institution :
Electr. & Comput. Eng., Univ. of Texas, Austin, TX, USA
fYear :
2013
fDate :
9-11 Dec. 2013
Abstract :
In this work, we report the state-of-the-art flexible devices based on graphene for radio-frequency transistors and large bandgap MoS2 for low-power digital transistors for flexible nanoelectronics. Our studies on graphene transistors feature record mobility, transit frequency, and tensile strain and the first demonstration of flexible capping layers. Our studies on MoS2 transistors yield the first comprehensive insights into the coupled electrical and mechanical properties including buckling which degrades the gate control, and the thickness dependence of electrical properties.
Keywords :
flexible electronics; graphene; low-power electronics; molybdenum compounds; nanoelectronics; tensile strength; 2D atomic channel materials; C; MoS2; capping layers; electrical properties; feature record mobility; flexible devices; flexible nanoelectronics; gate control; graphene transistors; high-frequency analog device; low-power digital device; low-power digital transistors; mechanical properties; radiofrequency transistors; tensile strain; transit frequency; Dielectrics; Field effect transistors; Graphene; Logic gates; Radio frequency; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
Type :
conf
DOI :
10.1109/IEDM.2013.6724658
Filename :
6724658
Link To Document :
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